Ms
University of Chicago
Chicago, IL, United States
Xella Doi is a fifth year PhD candidate at the University of Chicago, Pritzker School of Molecular Engineering. She previously completed a B.S. in Engineering Physics at Cornell University. Currently studying thin film growth at the nanoscale via development of a direct-write thin-film deposition system, she is passionate about applying fundamental scientific and engineering principals to create new technologies.
Disclosure information not submitted.