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    Ru-Gun Liu, PhD

    Vice President R&D & Fellow
    imec
    Leuven, Belgium

    Ru-Gun Liu, Ph.D. has been working in the field of patterning for over 25 years on developments ranging from OPC, lithography process, DTCO, integrated patterning and EDA. He is leading the imec Advanced Patterning Development organization consisting of patterning process and computational patterning developments. He was a CTO of an EDA start-up working on the software developments of patterning, DTCO, Yield and AI solutions. Prior to that Ru-Gun worked for 19 years at TSMC in a variety of leadership roles in the patterning organization, most recently as one of the Directors of Nano Patterning Technology organization. At TSMC he was responsible for high-NA EUV assessment, led the lithography pathfinding, OPC/RET and patterning DTCO teams.
    Ru-Gun holds a Ph.D. in Chemical Engineering from National Central University (Taiwan). He has over 300 granted US patents in multiple categories.

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    Presentation(s):